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Applied Optics

Applied Optics


  • Vol. 29, Iss. 34 — Dec. 1, 1990
  • pp: 5074–5079

Ion beam sputtered (SiO2)x(Si3N4)1−x antireflection coatings on laser facets produced using O2–N2 discharges

Yoshitada Katagiri and Hiroo Ukita  »View Author Affiliations

Applied Optics, Vol. 29, Issue 34, pp. 5074-5079 (1990)

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The chemical composition of a (SiO2)x(Si3N4)1−x film produced by ion beam sputtering was precisely controlled by the ratio of O2 and N2 flow rates under a discharge current kept constant to within an accuracy of ±0.05 A. The reproducibility of the refractive index was improved to ±0.01. This film was applied to form antireflection coatings with extremely low reflectivity on facets of 830-nm AlGaAs double heterostructure lasers. The minimum reflectivity was 6.8 × 10−5, and a reflectivity of 1 × 10−4 was achieved reproducibly. Experimental studies show that antireflection coatings are effective for suppressing the interferometric light output variation of composite cavity lasers.

© 1990 Optical Society of America

Original Manuscript: November 17, 1989
Published: December 1, 1990

Yoshitada Katagiri and Hiroo Ukita, "Ion beam sputtered (SiO2)x(Si3N4)1−x antireflection coatings on laser facets produced using O2–N2 discharges," Appl. Opt. 29, 5074-5079 (1990)

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