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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 4 — Feb. 1, 1990
  • pp: 477–482

Absolute reflectivity measurements at 44.79 Å of sputter deposited multilayer x-ray mirrors

M. Arbaoui, R. Barchewitz, C. Sella, and K. B. Youn  »View Author Affiliations


Applied Optics, Vol. 29, Issue 4, pp. 477-482 (1990)
http://dx.doi.org/10.1364/AO.29.000477


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Abstract

Multilayer x-ray mirrors have been deposited using a dc triode sputtering system, which incorporates an accurate method of thickness monitoring based on the dependence of the deposition rate on the target current. Thickness can be controlled with an accuracy of better than 0.1 Å. High efficiency W–C and Ni–C multilayer mirrors have been synthesized and tested at 1.54-Å (CuKα) and 44.79-Å (CKα). Absolute reflectivity measurements at λ = 44.79-Å (CKα) have been carried out. In this case the incident beam is previously polarized by a premonochromator equipped with a pair of parallel-plane multilayer mirrors fixed at an angle close to the Brewster (θ ≃ 45°). Thus the measured reflectivities are not affected by a progressive variation of the P-component.

© 1990 Optical Society of America

History
Original Manuscript: June 27, 1988
Published: February 1, 1990

Citation
M. Arbaoui, R. Barchewitz, C. Sella, and K. B. Youn, "Absolute reflectivity measurements at 44.79 Å of sputter deposited multilayer x-ray mirrors," Appl. Opt. 29, 477-482 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-4-477

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