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Applied Optics

Applied Optics


  • Vol. 29, Iss. 4 — Feb. 1, 1990
  • pp: 495–501

Deep ultraviolet microscope

Peter A. Heimann and R. Urstadt  »View Author Affiliations

Applied Optics, Vol. 29, Issue 4, pp. 495-501 (1990)

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A visible-light microscope has been modified to obtain deep UV (190–350-nm) images using reflected illumination. Potential advantages of deep UV microscopy include better resolution, depth of focus, and contrast for certain materials and fewer artifacts when viewing multilayered structures. These advantages are especially useful when viewing organic or semiconducting materials that are transparent or colored when viewed with visible light but are completely opaque when viewed using deep UV wavelengths. The hardware and optics of this microscope are described, and several uses are proposed for integrated circuit manufacture.

© 1990 Optical Society of America

Original Manuscript: March 23, 1989
Published: February 1, 1990

Peter A. Heimann and R. Urstadt, "Deep ultraviolet microscope," Appl. Opt. 29, 495-501 (1990)

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  1. J. M. Moran, D. Maydan, “High Resolution, Steep Profile, Resist Patterns,” Bell Syst. Tech. J. 58, 1027–1036 (1979).
  2. P. A. Heimann, J. M. Moran, R. J. Schutz, “Interferometric Methods and Apparatus for Device Fabrication,” U.S. Patent4,680,084 (July1987).
  3. These formulas are widely quoted but rarely referenced or derived. The resolution formula (Eq. 1a) is derived in F. A. Jenkins, H. E. White, Fundamental of Optics (McGraw-Hill, New York, 1976), p. 332ff. The depth of field formula [Eq. (1b)] is described in L. F. Thompson, C. G. Willson, M. J. S. Bowden, Eds. Introduction to Microlithography (Academic, New York, 1983), p. 44.
  4. F. A. Jenkins, H. E. White, Ref. 3, Chap. 3.
  5. See, for example, I. H. Malitson, “Interspecimen Comparison of the Refractive Index of Fused Silica,” J. Opt. Soc. Am. 55, 1205–1209 (1965), as cited in numerous reference handbooks. [CrossRef]
  6. Shipley Co., Inc., Newton, MA.
  7. Olin Hunt Specialty Products, Inc., West Paterson, NJ.
  8. For example, the Nanospec, from Nanometrics, Inc., Sunnyvale, CA.
  9. For example, the Leitz MPV CD, for E. Leitz Co., Rockleigh, NJ.
  10. For example, type R-166, from Hamamatsu Corp., Middlesex, NJ.
  11. D. L. White, unpublished.

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