OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 4 — Feb. 1, 1990
  • pp: 495–501

Deep ultraviolet microscope

Peter A. Heimann and R. Urstadt  »View Author Affiliations


Applied Optics, Vol. 29, Issue 4, pp. 495-501 (1990)
http://dx.doi.org/10.1364/AO.29.000495


View Full Text Article

Enhanced HTML    Acrobat PDF (1468 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

A visible-light microscope has been modified to obtain deep UV (190–350-nm) images using reflected illumination. Potential advantages of deep UV microscopy include better resolution, depth of focus, and contrast for certain materials and fewer artifacts when viewing multilayered structures. These advantages are especially useful when viewing organic or semiconducting materials that are transparent or colored when viewed with visible light but are completely opaque when viewed using deep UV wavelengths. The hardware and optics of this microscope are described, and several uses are proposed for integrated circuit manufacture.

© 1990 Optical Society of America

History
Original Manuscript: March 23, 1989
Published: February 1, 1990

Citation
Peter A. Heimann and R. Urstadt, "Deep ultraviolet microscope," Appl. Opt. 29, 495-501 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-4-495


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. J. M. Moran, D. Maydan, “High Resolution, Steep Profile, Resist Patterns,” Bell Syst. Tech. J. 58, 1027–1036 (1979).
  2. P. A. Heimann, J. M. Moran, R. J. Schutz, “Interferometric Methods and Apparatus for Device Fabrication,” U.S. Patent4,680,084 (July1987).
  3. These formulas are widely quoted but rarely referenced or derived. The resolution formula (Eq. 1a) is derived in F. A. Jenkins, H. E. White, Fundamental of Optics (McGraw-Hill, New York, 1976), p. 332ff. The depth of field formula [Eq. (1b)] is described in L. F. Thompson, C. G. Willson, M. J. S. Bowden, Eds. Introduction to Microlithography (Academic, New York, 1983), p. 44.
  4. F. A. Jenkins, H. E. White, Ref. 3, Chap. 3.
  5. See, for example, I. H. Malitson, “Interspecimen Comparison of the Refractive Index of Fused Silica,” J. Opt. Soc. Am. 55, 1205–1209 (1965), as cited in numerous reference handbooks. [CrossRef]
  6. Shipley Co., Inc., Newton, MA.
  7. Olin Hunt Specialty Products, Inc., West Paterson, NJ.
  8. For example, the Nanospec, from Nanometrics, Inc., Sunnyvale, CA.
  9. For example, the Leitz MPV CD, for E. Leitz Co., Rockleigh, NJ.
  10. For example, type R-166, from Hamamatsu Corp., Middlesex, NJ.
  11. D. L. White, unpublished.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited