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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 4 — Feb. 1, 1990
  • pp: 505–511

High resolution measurement of multilayer structures

Thomas M. Merklein  »View Author Affiliations


Applied Optics, Vol. 29, Issue 4, pp. 505-511 (1990)
http://dx.doi.org/10.1364/AO.29.000505


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Abstract

It is possible to measure the thickness of a single layer by the fringes-of-equal-chromatic-order interferometric system with nanometer resolution. This method uses Muller fringes which represent the Fourier transformed autocorrelation (i.e., power spectrum) of the surfaces. We show how this method can be expanded to multilayer structures with a maximum total thickness of some millimeters and a resolution of better than the diameter of an atomic layer. It is possible to evaluate the real multilayer sequence by holographically measuring two power spectra.

© 1990 Optical Society of America

History
Original Manuscript: September 5, 1989
Published: February 1, 1990

Citation
Thomas M. Merklein, "High resolution measurement of multilayer structures," Appl. Opt. 29, 505-511 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-4-505

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