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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 29, Iss. 4 — Feb. 1, 1990
  • pp: 583–588

Reflectance, transmittance, and loss spectra of multilayer Si/SiO2 thin film mirrors and antireflection coatings for 1.5 μm

J. Stone and L. W. Stulz  »View Author Affiliations


Applied Optics, Vol. 29, Issue 4, pp. 583-588 (1990)
http://dx.doi.org/10.1364/AO.29.000583


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Abstract

A method is described for measuring transmittance, reflectance, and loss spectra in thin optical films. The method is applied to measure the properties of multilayer coatings of Si and SiO2 used to make mirrors and antireflection coating in the 1.0–1.7-μm wavelength region. Mirrors with reflectance up to 99.5% with nine quarter-wavelength layers and two-layer antireflection coatings with reflectance of <0.2% have been made.

© 1990 Optical Society of America

History
Original Manuscript: June 8, 1989
Published: February 1, 1990

Citation
J. Stone and L. W. Stulz, "Reflectance, transmittance, and loss spectra of multilayer Si/SiO2 thin film mirrors and antireflection coatings for 1.5 μm," Appl. Opt. 29, 583-588 (1990)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-29-4-583


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References

  1. G. Hass, M. H. Francombe, R. W. Hoffman, Physics of Thin Film, Vol. 8 (Academic, New York, 1975), p. 27.
  2. W. T. Pawlewicz, P. M. Martin, J. W. Griffin, P. A. Temple, “1315 nm Dielectric Mirror Fabrication by Reactive Sputtering,” in Technical Digest, Topical Meeting on High Power Laser Optical Components, Boulder, CO, 18–19 Oct. (1984).
  3. O. S. Heavens, Optical Properties of Thin Films (Butterworth, Dover, 1955).
  4. D. C. Decker, V. A. Hodgkin, “Techniques of Reflectance and Transmittance of Thin Film Coatings as a Function of Temperature,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 167 (1982).
  5. D. Z. Anderson, J. C. Frisch, C. S. Masser, “Mirror Reflectometer Based on Optical Cavity Decay Time,” Appl. Opt. 23, 1238–1244 (1984). [CrossRef] [PubMed]
  6. M. Born, E. Wolf, Principles of Optics (Pergamon, New York, 1980), p. 68.
  7. H. A. Macleod, Thin-Film Optical Filters (Adam Hilger, London, 1986), p. 44.
  8. L. Ley, in The Physics of Hydrogenated Silicon II, J. D. Joannopoulos, G. Lucovsky, Eds. (Springer-Verlag, Berlin, 1984), p. 146.
  9. W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann, “Recent Developments in Reactively Sputtered Optical Thin Films,” Proc. Soc. Photo-Opt. Instrum. Eng. 325, 105–116 (1982).

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