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Position sensing of a grating mark by heterodyne detection using a Zeeman laser

Keiji Kataoka, Soichi Katagiri, and Toshiei Kurosaki

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Abstract

A way to detect with high resolution the position of a wafer and a mask is proposed and evaluated. In this method, a grating mark on a wafer or a mask is detected by heterodyne interference using a He–Ne Zeeman laser. Experiments show that the position of a wafer or a mask could be detected with a resolution of ~0.01 μm.

© 1991 Optical Society of America

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