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Photoresponse of ion-damaged germanium

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Abstract

Ion implantation was used to create predetermined defect densities to examine photoresponse for optoelectronic switch applications. Ion-damaged germanium shows a significant decrease in photoresponsivity with implant dose, particularly with doses exceeding the critical amorphizing dose (Dc ~ 1 × 1014 cm−2).

© 1991 Optical Society of America

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