Binary optics processing methods were applied to a silicon substrate to generate an array of small pillars in order to enhance transmission. The volume fraction of the silicon in the pillars was chosen to simulate a single homogeneous antireflection layer, and the pillar height was targeted to be a quarter-wave thickness. A mask was generated, using a graphics computer-aided design system; reactive-ion etching was used to generate the pillars. An improvement in long-wavelength infrared transmission is observed, with diffraction and scattering dominating at shorter wavelengths.
© 1992 Optical Society of America
Original Manuscript: November 12, 1990
Published: August 1, 1992
M. E. Motamedi, W. H. Southwell, and W. J. Gunning, "Antireflection surfaces in silicon using binary optics technology," Appl. Opt. 31, 4371-4376 (1992)