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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 31, Iss. 22 — Aug. 1, 1992
  • pp: 4371–4376

Antireflection surfaces in silicon using binary optics technology

M. E. Motamedi, W. H. Southwell, and W. J. Gunning  »View Author Affiliations


Applied Optics, Vol. 31, Issue 22, pp. 4371-4376 (1992)
http://dx.doi.org/10.1364/AO.31.004371


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Abstract

Binary optics processing methods were applied to a silicon substrate to generate an array of small pillars in order to enhance transmission. The volume fraction of the silicon in the pillars was chosen to simulate a single homogeneous antireflection layer, and the pillar height was targeted to be a quarter-wave thickness. A mask was generated, using a graphics computer-aided design system; reactive-ion etching was used to generate the pillars. An improvement in long-wavelength infrared transmission is observed, with diffraction and scattering dominating at shorter wavelengths.

© 1992 Optical Society of America

History
Original Manuscript: November 12, 1990
Published: August 1, 1992

Citation
M. E. Motamedi, W. H. Southwell, and W. J. Gunning, "Antireflection surfaces in silicon using binary optics technology," Appl. Opt. 31, 4371-4376 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-22-4371

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