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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 31, Iss. 22 — Aug. 1, 1992
  • pp: 4519–4521

Two-wavelength electronic speckle-pattern interferometry for the analysis of discontinuous deformation fields

G. Gülker, O. Haack, K. D. Hinsch, C. Hölscher, J. Kuls, and W. Platen  »View Author Affiliations


Applied Optics, Vol. 31, Issue 22, pp. 4519-4521 (1992)
http://dx.doi.org/10.1364/AO.31.004519


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Abstract

Ambiguity in the conversion of phase measurements to deformation values restricts the applicability of electronic speckle-pattern interferometry. The use of two wavelengths greatly relaxes this restriction.

© 1992 Optical Society of America

History
Original Manuscript: January 15, 1992
Published: August 1, 1992

Citation
G. Gülker, O. Haack, K. D. Hinsch, C. Hölscher, J. Kuls, and W. Platen, "Two-wavelength electronic speckle-pattern interferometry for the analysis of discontinuous deformation fields," Appl. Opt. 31, 4519-4521 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-22-4519


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References

  1. R. Jones, C. Wykes, Holographic and Speckle Interferometry (Cambridge U. Press, Cambridge, 1983).
  2. W. Jüptner, Th. Kreis, J. Geldmacher, “Determination of the absolute fringe order in hologram interferometry with wavelength controlled lasers,” in Industrial Laser Interferometry II, M. Y. Hung, R. J. Pryputniewicz, eds., Proc. Soc. Photo-Opt. Instrum. Eng.955, 143–146 (1988).
  3. G. Gülker, K. Hinsch, C. Hölscher, A. Kramer, H. Neunaber, “Electronic speckle pattern interferometry system for in situ deformation monitoring on buildings,” Opt. Eng. 29, 816–820 (1990). [CrossRef]

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