For the fabrication of large-area, spatially coherent gratings with periods of 100 nm or less, a grating interferometer is preferred over a conventional holographic configuration because of the limited coherence of available sources. Using a configuration that employs two matched fused silica phase gratings and an ArF excimer laser, we obtain high-quality 100-nm gratings in polymethyl methacrylate. We analyze the conditions for achieving high-contrast fringes with such an achromatic holographic configuration and show that the depth of focus depends only on the spatial coherence of the source. We also describe a highly accurate method for calculating the diffraction efficiency of the phase gratings as a function of polarization, incidence angle, and grating structure.
© 1992 Optical Society of America
Original Manuscript: July 22, 1991
Published: August 1, 1992
Anthony Yen, Erik H. Anderson, R. A. Ghanbari, M. L. Schattenburg, and Henry I. Smith, "Achromatic holographic configuration for 100-nm-period lithography," Appl. Opt. 31, 4540-4545 (1992)