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Applied Optics

Applied Optics


  • Vol. 31, Iss. 25 — Sep. 1, 1992
  • pp: 5230–5236

Gradient-index microlens formed by ion-beam sputtering

Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada  »View Author Affiliations

Applied Optics, Vol. 31, Issue 25, pp. 5230-5236 (1992)

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This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm × 3 μm at a distance of 11 μm from the lens facet.

© 1992 Optical Society of America

Original Manuscript: July 3, 1991
Published: September 1, 1992

Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada, "Gradient-index microlens formed by ion-beam sputtering," Appl. Opt. 31, 5230-5236 (1992)

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  1. J. Shimada, O. Ohguchi, R. Sawada, “Microlens Fabricated by the Planar Process,” in Proceedings of the Third Optoelectronics Conference, Chiba, Japan, 11–13 July 1990 (Institute of Electronics, Information and Communication Engineers, Tokyo, 1990), pp. 134–135.
  2. J. Shimada, O. Ohguchi, R. Sawada, “Microlens fabricated by the planar process,” IEEE J. Lightwave Technol. LT-9, 571–576 (1991). [CrossRef]
  3. J. Shimada, O. Ohguchi, R. Sawada, “Microlens integrated with a laser diode by using the planar process,” in Conference on Lasers and Electro-Optics, 1991 (Optical Society of America, Washington, D.C., 1991), p. 316.
  4. M. Oikawa, K. Iga, T. Sanada, “Distributed-Index Planar Microlens Array Prepared from Deep Electromigration,” Electron. Lett., 17, pp. 452–453 (1981). [CrossRef]
  5. G. D. Khoe, H. G. Kock, J. A. Luijendijk, C. H. J. van den Brekel, D. Kuppers, “Plasma CVD Prepared SiO2/Si3N4 Graded Index Lenses Integrated in Windows of Laser Diode Packages,” in Proceeding of the Seventh European Conference on Optical Communications, 1981 (Technical University of Denmark, Lyngby, 1981), pp. 7.6.1–4.
  6. E. H. Hirsch, I. K. Varga, “The effect of ion irradiation on the adherence of germanium films,” Thin Solid Films 52, 445–452 (1978). [CrossRef]
  7. F. Shimokawa, H. Tanaka, Y. Uenishi, R. Sawada, “Reactive-fast-atom beam etching of GaAs using Cl2 gas,” J. Appl. Phys. 66, 2613–2618 (1989). [CrossRef]
  8. R. Sawada, H. Tanaka, O. Ohguchi, J. Shimada, S. Hara, “Fabrication of Active Integrated Optical Micro-Encoder,” in Proceedings of the Fourth IEEE Workshop on Micro Electro Mechanical Systems, Nara, Japan, 30 January–2 February 1991 (Institute of Electrical and Electronics Engineers, New York, 1991), pp. 233–238.

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