Gradient-index microlens formed by ion-beam sputtering
Applied Optics, Vol. 31, Issue 25, pp. 5230-5236 (1992)
http://dx.doi.org/10.1364/AO.31.005230
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Abstract
This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 µm × 3 µm at a distance of 11 µm from the lens facet.
© 1992 Optical Society of America
Citation
Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada, "Gradient-index microlens formed by ion-beam sputtering," Appl. Opt. 31, 5230-5236 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-25-5230
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