This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm × 3 μm at a distance of 11 μm from the lens facet.
© 1992 Optical Society of America
Original Manuscript: July 3, 1991
Published: September 1, 1992
Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada, "Gradient-index microlens formed by ion-beam sputtering," Appl. Opt. 31, 5230-5236 (1992)