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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 31, Iss. 25 — Sep. 1, 1992
  • pp: 5230–5236

Gradient-index microlens formed by ion-beam sputtering

Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada  »View Author Affiliations


Applied Optics, Vol. 31, Issue 25, pp. 5230-5236 (1992)
http://dx.doi.org/10.1364/AO.31.005230


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Abstract

This paper describes the fabrication and characteristics of a gradient-index microlens by using a low-stress, high-transmittance film that is deposited by ion-beam sputtering. The key techniques in forming this film are sputtering with N2 gas, performing ion-beam irradiation during deposition, and stabilizing the deposition acceleration current. An integrated device consisting of the microlens and a laser diode is demonstrated. The focusing spot size is 2 μm × 3 μm at a distance of 11 μm from the lens facet.

© 1992 Optical Society of America

History
Original Manuscript: July 3, 1991
Published: September 1, 1992

Citation
Jun-ichi Shimada, Osamu Ohguchi, and Renshi Sawada, "Gradient-index microlens formed by ion-beam sputtering," Appl. Opt. 31, 5230-5236 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-25-5230

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