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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 31, Iss. 4 — Feb. 1, 1992
  • pp: 440_1–442

Choice of metal and wavelength for surface-plasmon resonance sensors: some considerations

Helene E. de Bruijn, Rob P. H. Kooyman, and Jan Greve  »View Author Affiliations


Applied Optics, Vol. 31, Issue 4, pp. 440_1-442 (1992)
http://dx.doi.org/10.1364/AO.31.0440_1


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Abstract

An optimal metal–waυelength combination depends on the measuring principle of the surface-plasmon resonance (SPR) sensor. Silυer at 800 nm is the best for fixed-angle measurements.

© 1992 Optical Society of America

History
Original Manuscript: December 26, 1990
Published: February 1, 1992

Citation
Helene E. de Bruijn, Rob P. H. Kooyman, and Jan Greve, "Choice of metal and wavelength for surface-plasmon resonance sensors: some considerations," Appl. Opt. 31, 440_1-442 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-4-440_1


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References

  1. R. P. H. Kooyman, H. Kolkman, J. van Gent, J. Greve, “Surface plasmon resonance immunosensors: sensitivity considerations,” Anal. Chim. Acta 213, 35–45 (1988). [CrossRef]
  2. E. Kretschmann, “Die bestimmungen optischer Konstanten von Metallen durch Anregung van Oberflächen plasma-schwingungen,” Z. Phys. 241, 313–341 (1971). [CrossRef]
  3. H. E. de Bruijn, R. P. H. Kooyman, J. Greve, “Determination of dielectric permittivity and thickness of a metal layer from a surface plasmon resonance experiment,” Appl. Opt. 29, 1974–1978 (1990). [CrossRef]
  4. E. M. Yeatman, E. A. Ash, “Surface plasmon scanning microscopy,” in Scanning Microscopy Technologies and Applications, E. C. Teague, ed., Proc. Soc. Photo-Opt. Instrum. Eng.897, 100–107 (1988).
  5. H. E. de Bruijn, B. S. F. Altenburg, R. P. H. Kooyman, J. Greve, “Determination of thickness and dielectric constant of thin transparent dielectric layers using surface plasmon resonance,” Opt. Commun. 82, 425–432 (1991). [CrossRef]
  6. G. Hass, “Optical properties of metals,” in American Institute of Physics Handbook, W. L. Wolfe, ed. (McGraw-Hill, New York, 1963).
  7. C. K. Hwangbo, L. J. Lingg, J. P. Lehan, H. A. Macleod, J. L. Makous, S. Y. Kim, “Ion assisted deposition of thermally evaporated Ag and Al films,” Appl. Opt. 28, 2769–2778 (1989). [CrossRef] [PubMed]

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