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Applied Optics

Applied Optics


  • Vol. 31, Iss. 4 — Feb. 1, 1992
  • pp: 485–487

Separation by ion implantation of oxygen (SIMOX) structures: estimating thicknesses

J. F. Marchiando and Jon Geist  »View Author Affiliations

Applied Optics, Vol. 31, Issue 4, pp. 485-487 (1992)

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The propagation of errors in the model parameters is compared for cases that analyze a simple separation by ion implantation of oxygen structure by using reflectometry and ellipsometry. Both methods give comparable values for the layer thicknesses. Both the radius of convergence and the values of uncertainty tend to be larger with reflectometry than with ellipsometry.

© 1992 Optical Society of America

Original Manuscript: November 5, 1990
Published: February 1, 1992

J. F. Marchiando and Jon Geist, "Separation by ion implantation of oxygen (SIMOX) structures: estimating thicknesses," Appl. Opt. 31, 485-487 (1992)

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  1. E. W. Palik, ed., Handbook of Optical Constants of Solids (Academic, Orlando, Fla., 1985).
  2. D. A. G. Bruggeman, “Calculation of the various physical constants of heterogeneous constants,” Ann. Phys. Ser. 5 24, 636–664 (1935). [CrossRef]
  3. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1987).
  4. J. F. Marchiando, “Semiconductor measurement technology: a software program for aiding the analysis of ellipsometric measurements, simple spectroscopic models,” NIST Spec. Publ. 400–84 (National Institute of Standards and Technology, Washington, D.C., 1989).

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