The propagation of errors in the model parameters is compared for cases that analyze a simple separation by ion implantation of oxygen structure by using reflectometry and ellipsometry. Both methods give comparable values for the layer thicknesses. Both the radius of convergence and the values of uncertainty tend to be larger with reflectometry than with ellipsometry.
© 1992 Optical Society of America
Original Manuscript: November 5, 1990
Published: February 1, 1992
J. F. Marchiando and Jon Geist, "Separation by ion implantation of oxygen (SIMOX) structures: estimating thicknesses," Appl. Opt. 31, 485-487 (1992)