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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 31, Iss. 4 — Feb. 1, 1992
  • pp: 485–487

Separation by ion implantation of oxygen (SIMOX) structures: estimating thicknesses

J. F. Marchiando and Jon Geist  »View Author Affiliations


Applied Optics, Vol. 31, Issue 4, pp. 485-487 (1992)
http://dx.doi.org/10.1364/AO.31.000485


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Abstract

The propagation of errors in the model parameters is compared for cases that analyze a simple separation by ion implantation of oxygen structure by using reflectometry and ellipsometry. Both methods give comparable values for the layer thicknesses. Both the radius of convergence and the values of uncertainty tend to be larger with reflectometry than with ellipsometry.

© 1992 Optical Society of America

History
Original Manuscript: November 5, 1990
Published: February 1, 1992

Citation
J. F. Marchiando and Jon Geist, "Separation by ion implantation of oxygen (SIMOX) structures: estimating thicknesses," Appl. Opt. 31, 485-487 (1992)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-31-4-485


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References

  1. E. W. Palik, ed., Handbook of Optical Constants of Solids (Academic, Orlando, Fla., 1985).
  2. D. A. G. Bruggeman, “Calculation of the various physical constants of heterogeneous constants,” Ann. Phys. Ser. 5 24, 636–664 (1935). [CrossRef]
  3. R. M. A. Azzam, N. M. Bashara, Ellipsometry and Polarized Light (North-Holland, Amsterdam, 1987).
  4. J. F. Marchiando, “Semiconductor measurement technology: a software program for aiding the analysis of ellipsometric measurements, simple spectroscopic models,” NIST Spec. Publ. 400–84 (National Institute of Standards and Technology, Washington, D.C., 1989).

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