Abstract

The thermal stability of Mo–Si multilayers prepared by magnetron sputtering is studied. It is found that degradation of x-ray reflectivity of Mo–Si multilayers under heat loading is connected with the roughening of Mo–Si interfaces and the formation of compounds Mo_xSi_y. To avoid these degradation mechanisms we fabricated and tested MoSi₂–Si multilayers under heat loading. The MoSi₂–Si multilayer appeared to be much more stable both in period and x-ray reflectivity because of thermodynamic equilibrium of the components MoSi₂ and Si at the interface. The working temperature of MoSi₂–Si multilayers reaches 1000 K.

© 1993 Optical Society of America

Tarnishing of Mo/Si multilayer x-ray mirrors

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