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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 14 — May. 10, 1993
  • pp: 2519–2525

Multilevel-grating array generators: fabrication error analysis and experiments

J. Michael Miller, Mohammad R. Taghizadeh, Jari Turunen, and Neil Ross  »View Author Affiliations


Applied Optics, Vol. 32, Issue 14, pp. 2519-2525 (1993)
http://dx.doi.org/10.1364/AO.32.002519


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Abstract

The effects of mask alignment and etch-depth errors in the array uniformity error U and diffraction efficiency η of multilevel-grating array illuminators are evaluated numerically. Also demonstrated are 16-level fan-out elements with array size up to 32 × 16, with U = 5%–10% and η = 83%–92%. These are fabricated with electron-beam-written binary masks, optical alignment and contact copying, and reactive ion etching. Good agreement between the predictions of the error analysis and the performance of the fabricated components is observed.

© 1993 Optical Society of America

History
Original Manuscript: July 14, 1992
Published: May 10, 1993

Citation
J. Michael Miller, Mohammad R. Taghizadeh, Jari Turunen, and Neil Ross, "Multilevel-grating array generators: fabrication error analysis and experiments," Appl. Opt. 32, 2519-2525 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-14-2519


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