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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 14 — May. 10, 1993
  • pp: 2555–2565

Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography

Daniel M. Newman, Robert W. Hawley, Dennis L. Goeckel, Richard D. Crawford, Seth Abraham, and Neal C. Gallagher  »View Author Affiliations


Applied Optics, Vol. 32, Issue 14, pp. 2555-2565 (1993)
http://dx.doi.org/10.1364/AO.32.002555


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Abstract

An efficient storage format was developed for computer-generated holograms for use in electron-beam lithography. This method employs run-length encoding and Lempel–Ziv–Welch compression and succeeds in exposing holograms that were previously infeasible owing to the hologram’s tremendous pattern-data file size. These holograms also require significant computation; thus the algorithm was implemented on a parallel computer, which improved performance by 2 orders of magnitude. The decompression algorithm was integrated into the Cambridge electron-beam machine’s front-end processor. Although this provides much-needed ability, some hardware enhancements will be required in the future to overcome inadequacies in the current front-end processor that result in a lengthy exposure time.

© 1993 Optical Society of America

History
Original Manuscript: July 6, 1992
Published: May 10, 1993

Citation
Daniel M. Newman, Robert W. Hawley, Dennis L. Goeckel, Richard D. Crawford, Seth Abraham, and Neal C. Gallagher, "Efficient storage, computation, and exposure of computer-generated holograms by electron-beam lithography," Appl. Opt. 32, 2555-2565 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-14-2555


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References

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