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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 22 — Aug. 1, 1993
  • pp: 4114–4116

Ultraviolet/ozone cleaning of carbon-contaminated optics

Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller  »View Author Affiliations


Applied Optics, Vol. 32, Issue 22, pp. 4114-4116 (1993)
http://dx.doi.org/10.1364/AO.32.004114


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Abstract

It is shown that ozone generated by UV light can be used to clean carbon-contaminated synchrotron-radiation optics.

© 1993 Optical Society of America

History
Original Manuscript: December 18, 1992
Published: August 1, 1993

Citation
Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller, "Ultraviolet/ozone cleaning of carbon-contaminated optics," Appl. Opt. 32, 4114-4116 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-22-4114


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References

  1. K. Boiler, R. P. Haeblich, H. Hogrefe, W. Jark, C. Kunz, “Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation,” Nucl. Instrum. Methods 208, 237–279 (1983).
  2. R. A. Rosenberg, D. C. Mancini, “Deposition of carbon on gold using synchrotron radiation,” Nucl. Instrum. Methods A 291, 101–106 (1990). [CrossRef]
  3. E. D. Johnson, S. L. Hulbert, R. F. Garrett, G. P. Williams, M. L. Knotek, “In situ reactive glow discharge cleaning of x-ray optical surfaces,” Rev. Sci. Instrum. 58, 1042–1045 (1987). [CrossRef]
  4. T. Koide, T. Shidara, K. Tanaka, A. Yagashita, S. Sato, “In situ oxygen-discharge cleaning system for optical elements,” Rev. Sci. Instrum. 60, 2034–2037 (1989). [CrossRef]
  5. R. A. Rosenberg, J. A. Smith, D. J. Wallace, “Plasma cleaning of beamline optical components: contamination and gas composition effects,” Rev. Sci. Instrum. 63, 1486–1489 (1992). [CrossRef]
  6. T. Harada, S. Yamaguchi, M. Itou, S. Mitani, H. Maezawa, A. Mikuni, W. Okamoto, H. Yamaoka, “Ultraviolet/ozone cleaning of a soft-x-ray grating contaminated by synchrotron radiation,” Appl. Opt. 309, 1165–1168.
  7. J. R. Vig, “UV/ozone cleaning of surfaces’ research and development,” Tech. Rep. SLCET-TR-86-6 (U.S. Army Laboratory Command, Fort Monmouth, N.J., May1986).
  8. L. Zafonte, R. Chiu, “UV/ozone cleaning for organics removal in silicon wafers,” in Optical Microlithography III Technology for the Next Decade, H. L. Stower, ed., Proc. Soc. Photo-Opt. Instrum. Eng.470, 164–175 (1984).
  9. Spectronics Corporation, 956 Bush Hollow Road, P.O. Box 448, Westbury, N.Y. 11590.
  10. Inficon Inc., 5 Adler Drive, East Syracuse, N.Y. 13057.

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