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Applied Optics

Applied Optics


  • Vol. 32, Iss. 22 — Aug. 1, 1993
  • pp: 4114–4116

Ultraviolet/ozone cleaning of carbon-contaminated optics

Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller  »View Author Affiliations

Applied Optics, Vol. 32, Issue 22, pp. 4114-4116 (1993)

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It is shown that ozone generated by UV light can be used to clean carbon-contaminated synchrotron-radiation optics.

© 1993 Optical Society of America

Original Manuscript: December 18, 1992
Published: August 1, 1993

Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller, "Ultraviolet/ozone cleaning of carbon-contaminated optics," Appl. Opt. 32, 4114-4116 (1993)

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  1. K. Boiler, R. P. Haeblich, H. Hogrefe, W. Jark, C. Kunz, “Investigation of carbon contamination of mirror surfaces exposed to synchrotron radiation,” Nucl. Instrum. Methods 208, 237–279 (1983).
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  8. L. Zafonte, R. Chiu, “UV/ozone cleaning for organics removal in silicon wafers,” in Optical Microlithography III Technology for the Next Decade, H. L. Stower, ed., Proc. Soc. Photo-Opt. Instrum. Eng.470, 164–175 (1984).
  9. Spectronics Corporation, 956 Bush Hollow Road, P.O. Box 448, Westbury, N.Y. 11590.
  10. Inficon Inc., 5 Adler Drive, East Syracuse, N.Y. 13057.

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