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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 22 — Aug. 1, 1993
  • pp: 4114–4116

Ultraviolet/ozone cleaning of carbon-contaminated optics

Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller  »View Author Affiliations


Applied Optics, Vol. 32, Issue 22, pp. 4114-4116 (1993)
http://dx.doi.org/10.1364/AO.32.004114


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Abstract

It is shown that ozone generated by UV light can be used to clean carbon-contaminated synchrotron-radiation optics.

© 1993 Optical Society of America

History
Original Manuscript: December 18, 1992
Published: August 1, 1993

Citation
Roger W. C. Hansen, Mark Bissen, Dan Wallace, Jeff Wolske, and Tom Miller, "Ultraviolet/ozone cleaning of carbon-contaminated optics," Appl. Opt. 32, 4114-4116 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-22-4114

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