Special substrate-film designs are used to measure roughness-induced scattering and scattering from the volume of optical thin films separately. So theoretical models of surface roughness and volume scattering become applicable to the experimental data, and quantitative information on thin-film microstructure can be derived. Measuring total integrated and angle-resolved scattering on oxide, fluoride, and chalcogenide films of different film thicknesses yields the evolution law of microstructural growth, which for the majority of investigated films roughly follows a square-root dependence on film thickness. Packing densities of fluoride films calculated from volume-scattering data are found to agree with results from quartz-crystal monitoring.

© 1993 Optical Society of America

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