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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 28 — Oct. 1, 1993
  • pp: 5481–5491

From light scattering to the microstructure of thin-film multilayers

C. Amra  »View Author Affiliations


Applied Optics, Vol. 32, Issue 28, pp. 5481-5491 (1993)
http://dx.doi.org/10.1364/AO.32.005481


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Abstract

It is shown how light scattering provides a powerful tool for thin-film characterization. The introduction of a roughness isotropy degree permits the extraction of structural parameters of the stacks. Replication functions and residual roughnesses are given for TiO2, SiO2, and Ta2O5 materials produced by ion-assisted deposition and ion plating. Additional confirmation is given by measurements of scattering versus wavelength. The sensitivity of design to material and substrate effects is studied. At low-loss levels, surface and bulk phenomena are discussed together. Microstructure is characterized in the frequency bandwidth given by experiment.

© 1993 Optical Society of America

History
Original Manuscript: November 16, 1992
Published: October 1, 1993

Citation
C. Amra, "From light scattering to the microstructure of thin-film multilayers," Appl. Opt. 32, 5481-5491 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-28-5481

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