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Applied Optics

Applied Optics


  • Vol. 32, Iss. 28 — Oct. 1, 1993
  • pp: 5561–5566

Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials

Rung-Ywan Tsai, Lee-Chin Kuo, and Fang Chuan Ho  »View Author Affiliations

Applied Optics, Vol. 32, Issue 28, pp. 5561-5566 (1993)

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Durable, uniform, and reproducible amorphous silicon and amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition that are appropriate for the design and fabrication of optical interference filters in the near-infrared region are found. Optical and physicalk properties of single-layer films are discussed. The durability and performance of Fabry–Perot interference filters and a 15-layer long-pass edge filter in the near-infrared region designed and fabricated with these two thin-film materials are also reported.

© 1993 Optical Society of America

Original Manuscript: November 16, 1992
Published: October 1, 1993

Rung-Ywan Tsai, Lee-Chin Kuo, and Fang Chuan Ho, "Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials," Appl. Opt. 32, 5561-5566 (1993)

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  1. M. J. Kushner, “Simulation of the gas-phase processes in remote-plasma-activated chemical-vapor deposition of silicon dielectrics using rare gas-silane-ammonia mixtures,” J. Appl. Phys. 71, 4173–4189 (1992). [CrossRef]
  2. D. L. Smith, A. S. Alimonda, C. C. Chen, S. E. Ready, B. Wacker, “Mechanism of SiNxHy deposition from NH3–SiH4 plasma,” J. Electrochem. Soc. 137, 614–623 (1990). [CrossRef]
  3. K. Maeda, I. Umezu, “Atomic microstructure and electronic properties of a-SiNx:H deposited by radio frequency glow discharge,” J. Appl. Phys. 70, 2745–2754 (1991). [CrossRef]
  4. W. D. Partlow, W. J. Choyke, J. M. Bennett, R. M. Silva, “Optical characterization of low-scatter, plasma-deposited thin films,” in Laser Induced Damage in Optical Materials (1983), H. E. Bennett, A. H. Guenther, D. Milam, B. E. Newnam, eds., NBS (U.S.) Spec. Pub.688, 302–310 (1985). [CrossRef]
  5. P. Boher, P. Houdy, L. Hennett, J. P. Delaboundiniere, M. Kuhner, P. Muller, Z. G. Li, D. J. Smith, “Silicon/silicon oxide and silicon/silicon nitride multilayers for extreme ultraviolet optical application,” Opt. Eng. 30, 1049–1060 (1991). [CrossRef]
  6. T. Itoh, S. Nitta, S. Nonomura, “Optical properties of amorphous multilayers a-Si:H/a-Si3N4:H with random well or barrier layer thickness,” J. Non-Cryst. Solids 114, 723–725 (1989). [CrossRef]
  7. H. R. Philipp, “Optical properties of silicon nitride,” J. Electrochem. Soc. 120, 295–300 (1973). [CrossRef]
  8. R. Y. Tsai, L. C. Kao, F. C. Ho, “Optical characterization of amorphous SiNx:H films prepared by plasma-enhanced CVD,” presented at the Materials Research Society Fall Meeting, Boston, Mass., 30 November–4 December 1992.
  9. N. Ibaraki, H. Fritzsche, “Properties of amorphous semiconducting a-Si:H/a-SiNx:H multilayer films and of a-SiNx:H alloys,” Phys. Rev. B 30, 5791–5799 (1984). [CrossRef]
  10. B. Abeles, T. Tiedje, “Amorphous semiconductor superlattices,” Phys. Rev. Lett. 51, 3003–3006 (1983). [CrossRef]
  11. J. A. Dobrowolski, F. C. Ho, A. Waldorf, “Determination of optical constants of thin film coating materials based on inverse synthesis,” Appl. Opt. 22, 3191–3200 (1983). [CrossRef] [PubMed]
  12. L. Li, Y.-H. Yen, “Wideband monitoring and measuring system for optical coatings,” Appl. Opt. 28, 2889–2894 (1989). [CrossRef] [PubMed]
  13. A. Shah, J. Dutta, N. Wyrsch, K. Prasad, H. Curtins, F. Finger, A. Howling, C. Hollenstein, “VHF plasma deposition: a comparative overview,” presented at the Materials Research Society Spring Meeting, San Francisco, Calif., 27 April–1 May 1992.

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