Durable, uniform, and reproducible amorphous silicon and amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition that are appropriate for the design and fabrication of optical interference filters in the near-infrared region are found. Optical and physicalk properties of single-layer films are discussed. The durability and performance of Fabry–Perot interference filters and a 15-layer long-pass edge filter in the near-infrared region designed and fabricated with these two thin-film materials are also reported.
© 1993 Optical Society of America
Original Manuscript: November 16, 1992
Published: October 1, 1993
Rung-Ywan Tsai, Lee-Chin Kuo, and Fang Chuan Ho, "Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials," Appl. Opt. 32, 5561-5566 (1993)