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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 32, Iss. 28 — Oct. 1, 1993
  • pp: 5561–5566

Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials

Rung-Ywan Tsai, Lee-Chin Kuo, and Fang Chuan Ho  »View Author Affiliations


Applied Optics, Vol. 32, Issue 28, pp. 5561-5566 (1993)
http://dx.doi.org/10.1364/AO.32.005561


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Abstract

Durable, uniform, and reproducible amorphous silicon and amorphous silicon nitride thin films deposited by plasma-enhanced chemical vapor deposition that are appropriate for the design and fabrication of optical interference filters in the near-infrared region are found. Optical and physicalk properties of single-layer films are discussed. The durability and performance of Fabry–Perot interference filters and a 15-layer long-pass edge filter in the near-infrared region designed and fabricated with these two thin-film materials are also reported.

© 1993 Optical Society of America

History
Original Manuscript: November 16, 1992
Published: October 1, 1993

Citation
Rung-Ywan Tsai, Lee-Chin Kuo, and Fang Chuan Ho, "Amorphous silicon and amorphous silicon nitride films prepared by a plasma-enhanced chemical vapor deposition process as optical coating materials," Appl. Opt. 32, 5561-5566 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-28-5561

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