Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography
Applied Optics, Vol. 32, Issue 34, pp. 7022-7031 (1993)
http://dx.doi.org/10.1364/AO.32.007022
Acrobat PDF (1299 KB)
Abstract
Techniques are described for at-wavelength interferometry of multilayer coated optics designed for use in extreme-ultraviolet lithography. Broadly tunable undulator radiation, which covers the spectral region from 45 to 400 Å, is described. The coherent power available at these wavelengths is described, and several types of interferometer that might be suitable at these short wavelengths are also described.
© 1993 Optical Society of America
Citation
David Attwood, Gary Sommargren, Raul Beguiristain, Khanh Nguyen, Jeffrey Bokor, Natale Ceglio, Keith Jackson, Masato Koike, and James Underwood, "Undulator radiation for at-wavelength interferometry of optics for extreme-ultraviolet lithography," Appl. Opt. 32, 7022-7031 (1993)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-32-34-7022
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
« Previous Article | Next Article »
OSA is a member of 