A fluid-mechanical model is developed for the float-polishing process. In this model laminar flow between the sample and the lap results in pressure gradients at the grooves that support the sample on a fluid layer. The laminar fluid motion also produces supersmooth, damage-free surfaces. Quartz substrates for applications in high-stress environments were float polished, and their surfaces were analyzed by optical scatterometry, photoacoustic spectroscopy, and atomic force microscopy. The removal of 100 μm of material by a lapping–polishing process, with final float polishing, left low levels of subsurface damage, with a surface roughness of approximately 0.2-nm rms.
© 1994 Optical Society of America
Original Manuscript: May 18, 1992
Revised Manuscript: March 19, 1993
Published: January 1, 1994
S. F. Soares, D. R. Baselt, J. P. Black, K. C. Jungling, and W. K. Stowell, "Float-polishing process and analysis of float-polished quartz," Appl. Opt. 33, 89-95 (1994)