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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 33, Iss. 10 — Apr. 1, 1994
  • pp: 2032–2038

Electron-beam writing system and its application to large and high-density diffractive optic elements

Shiro Ogata, Masami Tada, and Masahiro Yoneda  »View Author Affiliations


Applied Optics, Vol. 33, Issue 10, pp. 2032-2038 (1994)
http://dx.doi.org/10.1364/AO.33.002032


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Abstract

An electron-beam writing system that is characterized by a stationary electron beam and a continuously spinning table is proposed and developed for diffractive optic elements with axisymmetric patterns. This system allows us to fabricate continuously concentric or radialized high-density microgratings with effective areas over the electron-beam deflection limits. For a fine electron-dose distribution, we adopted multiple-revolution writing and electron-beam modulation. Several test gratings, including a rotary encoder disk with a 1.57-μm grating pitch and a 15-mm diameter and a blazed micro-Fresnel lens with a 4.5-mm diameter and a N.A. of 0.45, are successfully demonstrated with real-time data processing.

© 1994 Optical Society of America

History
Original Manuscript: September 14, 1992
Published: April 1, 1994

Citation
Shiro Ogata, Masami Tada, and Masahiro Yoneda, "Electron-beam writing system and its application to large and high-density diffractive optic elements," Appl. Opt. 33, 2032-2038 (1994)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-33-10-2032

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