Quantitatively measured photorefractive sensitivity of proton-exchanged lithium niobate, proton-exchanged magnesium oxide-doped lithium niobate, and ion-exchanged potassium titanyl phosphate waveguides

Yukiko Kondo; Satoshi Miyaguchi; Atsushi Onoe; Yoichi Fujii

doi:10.1364/AO.33.003348

Applied Optics
Vol. 33,
Issue 16,
pp. 3348-3352
(1994)
•https://doi.org/10.1364/AO.33.003348

Quantitatively measured photorefractive sensitivity of proton-exchanged lithium niobate, proton-exchanged magnesium oxide-doped lithium niobate, and ion-exchanged potassium titanyl phosphate waveguides

Yukiko Kondo, Satoshi Miyaguchi, Atsushi Onoe, and Yoichi Fujii

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Yukiko Kondo, Satoshi Miyaguchi, Atsushi Onoe, and Yoichi Fujii, "Quantitatively measured photorefractive sensitivity of proton-exchanged lithium niobate, proton-exchanged magnesium oxide-doped lithium niobate, and ion-exchanged potassium titanyl phosphate waveguides," Appl. Opt. 33, 3348-3352 (1994)

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Abstract

The photorefractive sensitivities of proton-exchanged lithium niobate waveguides and Rb-ion-exchanged potassium titanyl phosphate waveguides are quantitatively measured, and their influence on waveguide applications is estimated.

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Waveguide Material	Sample	Initial Depth of Proton-Exchanged Layer (μm)	Annealing Conditions at 350 °C (h)
LN (z cut)	A	2.1	No annealing
	B1	0.32	2
	B2	0.31	4
	B3	0.25	4
MgO-doped LN (z cut)	M0	1.9	No annealing
	Ml	0.47	2
	M2	0.35	4

Sample	Diffusion Temperature (°C)	Time (min)	Ba(NO₃)₂/RbNO₃ (mol. %)
K1	320	45	3
K2	320	10	15

Waveguide Material	Sample	Diffusion Depth (μm)	Energy Density (J/cm²)	Diffraction Efficiency η(%)	Δn/E (cm²/J)
LN (z cut)	A	2.1	1.1 × 10⁶	0.74	3.8 × 10⁻¹²
	B1	2.1	4.0 × 10³	0.62	0.98 × 10⁻⁹
	B2	1.8	1.0 × 10³	1.0	5.0 × 10⁻⁹
	B3	3.7	9.9 × 10²	1.0	5.2 × 10⁻⁹
MgO-doped LN (z cut)	MO	1.9	2.7 × 10⁵	0.9	1.8 × 10⁻¹¹
	M1	1.9	2.7 × 10³	1.5	2.3 × 10⁻⁹
	M2	4.7	3.6 × 10²	1.0	1.4 × 10⁻⁸
KTP (z cut)	K1	13	6.7 × 10³	0.5	5.2 × 10⁻¹⁰
KTP (z cut)	K2	11	7.4 × 10²	1.0	6.8 × 10⁻⁹

Waveguide Material	Sample	Initial Depth of Proton-Exchanged Layer (μm)	Annealing Conditions at 350 °C (h)
LN (z cut)	A	2.1	No annealing
	B1	0.32	2
	B2	0.31	4
	B3	0.25	4
MgO-doped LN (z cut)	M0	1.9	No annealing
	Ml	0.47	2
	M2	0.35	4

Sample	Diffusion Temperature (°C)	Time (min)	Ba(NO₃)₂/RbNO₃ (mol. %)
K1	320	45	3
K2	320	10	15

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Applied Optics