Abstract

Within the direct inclusion method the proximity effect is already taken care of when one calculates the kinoform relief, whereas conventionally the proximity effect is compensated for after one has calculated the relief. In particular, when proximity effects are considerable, that is, for small structures, the direct inclusion method is shown to give significantly better results than the conventional two-step method.

Provided that the proximity effect is correctly modeled, it is shown that for an 8 × 8 array illuminator nearly perfect uniformity can be achieved even for a kinoform with very small structures.

© 1994 Optical Society of America

Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

Fredrik Nikolajeff, Jörgen Bengtsson, Michael Larsson, Mats Ekberg, and Sverker Hård
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Successive development optimization of resist kinoforms manufactured with direct-writing, electron-beam lithography

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Proximity-compensated blazed transmission grating manufacture with direct-writing, electron-beam lithography

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Kinoform design with an optimal-rotation-angle method

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Jörgen Bengtsson
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