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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 33, Iss. 5 — Feb. 10, 1994
  • pp: 744–757

Submicrometer defect detection in periodic structures by photorefractive holography: system design and performance

Craig Uhrich and Lambertus Hesselink  »View Author Affiliations


Applied Optics, Vol. 33, Issue 5, pp. 744-757 (1994)
http://dx.doi.org/10.1364/AO.33.000744


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Abstract

We have built an adaptive system capable of detecting submicrometer defects in periodic structures by using real-time holography in photorefractive crystals. We summarize the design and optimization of the defect-enhancement system. We present representative results of 0.2- to 0.5-μm diameter defect detection on two different periodic substrates: chrome-on-glass masks and patterned silicon wafers. On patterned silicon we detect 94% of the 0.5-μm diameter defects with three false positives, while inspecting an area greater than 1 mm2 in 20 s or less. The throughput on the glass masks is somewhat less. To the best of our knowledge, these defects have an area 100 times smaller than those previously detected with any real-time holographic technique.

© 1994 Optical Society of America

History
Original Manuscript: August 17, 1992
Revised Manuscript: May 25, 1993
Published: February 10, 1994

Citation
Craig Uhrich and Lambertus Hesselink, "Submicrometer defect detection in periodic structures by photorefractive holography: system design and performance," Appl. Opt. 33, 744-757 (1994)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-33-5-744


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