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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 33, Iss. 7 — Mar. 1, 1994
  • pp: 1223–1229

Image scanning ellipsometry for measuring nonuniform film thickness profiles

An-Hong Liu, Peter C. Wayner, Jr., and Joel L. Plawsky  »View Author Affiliations


Applied Optics, Vol. 33, Issue 7, pp. 1223-1229 (1994)
http://dx.doi.org/10.1364/AO.33.001223


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Abstract

A novel technique to measure the two-dimensional (2-D) thickness profile of a nonuniform, thin film, from several nanometers to several micrometers, in a steady state as well as in a transient state has been developed and tested. Image scanning ellipsometry (ISE) is a full-field imaging technique that one can use to study every point on the surface simultaneously with high spatial resolution and thickness sensitivity, i.e., it can measure and map the 2-D film thickness profile. The primary purpose of this paper is to present the basic concept of ISE and a demonstration of its use.

© 1994 Optical Society of America

History
Original Manuscript: November 30, 1992
Revised Manuscript: June 4, 1993
Published: March 1, 1994

Citation
An-Hong Liu, Peter C. Wayner, and Joel L. Plawsky, "Image scanning ellipsometry for measuring nonuniform film thickness profiles," Appl. Opt. 33, 1223-1229 (1994)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-33-7-1223

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