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Applied Optics

Applied Optics


  • Vol. 34, Iss. 28 — Oct. 1, 1995
  • pp: 6389–6392

Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics

L. B. Da Silva, T. W. Barbee, Jr., R. Cauble, P. Celliers, D. Ciarlo, J. C. Moreno, S. Mrowka, J. E. Trebes, A. S. Wan, and F. Weber  »View Author Affiliations

Applied Optics, Vol. 34, Issue 28, pp. 6389-6392 (1995)

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The development of multilayer mirror technology capable of operating in the range of 3–30 nm and the construction of thin membranes with excellent uniformity and strength have made it possible to design and implement a Mach–Zehnder interferometer operating at 15.5 nm. We have tested this interferometer by using a soft x-ray laser as a source, and we show its use in probing high-density plasmas.

© 1995 Optical Society of America

Original Manuscript: December 23, 1994
Revised Manuscript: March 16, 1995
Published: October 1, 1995

L. B. Da Silva, T. W. Barbee, R. Cauble, P. Celliers, D. Ciarlo, J. C. Moreno, S. Mrowka, J. E. Trebes, A. S. Wan, and F. Weber, "Extreme-ultraviolet interferometry at 15.5 nm using multilayer optics," Appl. Opt. 34, 6389-6392 (1995)

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