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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 34, Iss. 5 — Feb. 10, 1995
  • pp: 897–903

Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms

Fredrik Nikolajeff, Jörgen Bengtsson, Michael Larsson, Mats Ekberg, and Sverker Hård  »View Author Affiliations


Applied Optics, Vol. 34, Issue 5, pp. 897-903 (1995)
http://dx.doi.org/10.1364/AO.34.000897


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Abstract

The proximity effect in successively developed direct-write electron-beam lithography gratings is measured. The grating relief shapes are obtained from the measured power in several of the gratings' diffraction orders. Describing the proximity effect by a convolution with a double Gaussian point-spread function, we determine the parameters of the point-spread function. The writing part of the point-spread function is found to increase significantly with increasing development time, the background part much less.

© 1995 Optical Society of America

History
Original Manuscript: January 3, 1994
Revised Manuscript: September 15, 1994
Published: February 10, 1995

Citation
Fredrik Nikolajeff, Jörgen Bengtsson, Michael Larsson, Mats Ekberg, and Sverker Hård, "Measuring and modeling the proximity effect in direct-write electron-beam lithography kinoforms," Appl. Opt. 34, 897-903 (1995)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-34-5-897


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