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Applied Optics

Applied Optics


  • Vol. 35, Iss. 1 — Jan. 1, 1996
  • pp: 90–96

Mixed films of TiO2–SiO2 deposited by double electron-beam coevaporation

Jyh-Shin Chen, Shiuh Chao, Jiann-Shiun Kao, Huan Niu, and Chih-Hsin Chen  »View Author Affiliations

Applied Optics, Vol. 35, Issue 1, pp. 90-96 (1996)

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We used double electron-beam coevaporation to fabricate TiO2–SiO2 mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO2 to pure TiO2 as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO2 content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO2 film because of its amorphous structure. Linear and Bruggeman's effective medium approximation models fit the experimental data better than other models.

© 1996 Optical Society of America

Original Manuscript: February 2, 1995
Revised Manuscript: July 13, 1995
Published: January 1, 1996

Jyh-Shin Chen, Shiuh Chao, Jiann-Shiun Kao, Huan Niu, and Chih-Hsin Chen, "Mixed films of TiO2–SiO2 deposited by double electron-beam coevaporation," Appl. Opt. 35, 90-96 (1996)

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