We used double electron-beam coevaporation to fabricate TiO2—SiO2 mixed films. The deposition process included oxygen partial pressure, substrate temperature, and deposition rate, all of which were real-time computer controlled. The optical properties of the mixed films varied from pure SiO2 to pure TiO2 as the composition of the films varied accordingly. X-ray diffraction showed that the mixed films all have amorphous structure with a SiO2 content of as low as 11%. Atomic force microscopy showed that the mixed film has a smoother surface than pure TiO2 film because of its amorphous structure.
Linear and Bruggeman’s effective medium approximation models fit the experimental data better than other models.
© 1996 Optical Society of America
Jyh-Shin Chen, Shiuh Chao, Jiann-Shiun Kao, Huan Niu, and Chih-Hsin Chen, "Mixed films of TiO2—SiO2 deposited by double electron-beam coevaporation," Appl. Opt. 35, 90-96 (1996)