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Applied Optics

Applied Optics


  • Vol. 35, Iss. 22 — Aug. 1, 1996
  • pp: 4490–4493

Multilayer technology for diffractive optical elements

B. Goebel, L. L. Wang, and T. Tschudi  »View Author Affiliations

Applied Optics, Vol. 35, Issue 22, pp. 4490-4493 (1996)

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The proposed multilayer technology makes it possible to approximate a continuous phase distribution by discrete phase steps. Compared with binary techniques, a higher diffraction efficiency can be achieved. In most known processes a bulk substrate is used and etched directly; therefore it is difficult to control the height of the phase steps. We propose applying layers of a well-known thickness and structuring them with a selective etching process. In this new multilayer process for reflecting elements a system of metal and dielectric layers is used that can easily be produced by standard methods.

© 1996 Optical Society of America

Original Manuscript: September 11, 1995
Revised Manuscript: February 26, 1996
Published: August 1, 1996

B. Goebel, L. L. Wang, and T. Tschudi, "Multilayer technology for diffractive optical elements," Appl. Opt. 35, 4490-4493 (1996)

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