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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 24 — Aug. 20, 1996
  • pp: 4827–4834

Directional reflectance characterization facility and measurement methodology

B. T. McGuckin, D. A. Haner, R. T. Menzies, C. Esproles, and A. M. Brothers  »View Author Affiliations


Applied Optics, Vol. 35, Issue 24, pp. 4827-4834 (1996)
http://dx.doi.org/10.1364/AO.35.004827


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Abstract

A precision reflectance characterization facility, constructed specifically for the measurement of the bidirectional reflectance properties of Spectralon panels planned for use as in-flight calibrators on the NASA Multiangle Imaging Spectroradiometer (MISR) instrument is described. The incident linearly polarized radiation is provided at three laser wavelengths: 442, 632.8, and 859.9 nm. Each beam is collimated when incident on the Spectralon. The illuminated area of the panel is viewed with a silicon photodetector that revolves around the panel (360°) on a 30-cm boom extending from a common rotational axis. The reflected radiance detector signal is ratioed with the signal from a reference detector to minimize the effect of amplitude instabilities in the laser sources. This and other measures adopted to reduce noise have resulted in a bidirectional reflection function (BRF) calibration facility with a measurement precision with regard to a BRF measurement of ±0.002 at the 1σ confidence level. The Spectralon test piece panel is held in a computer-controlled three-axis rotational assembly capable of a full 360° rotation in the horizontal plane and 90° in the vertical. The angular positioning system has repeatability and resolution of 0.001°. Design details and an outline of the measurement methodology are presented.

© 1996 Optical Society of America

History
Original Manuscript: December 3, 1995
Revised Manuscript: March 4, 1996
Published: August 20, 1996

Citation
B. T. McGuckin, D. A. Haner, R. T. Menzies, C. Esproles, and A. M. Brothers, "Directional reflectance characterization facility and measurement methodology," Appl. Opt. 35, 4827-4834 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-24-4827


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References

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