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Applied Optics

Applied Optics


  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5052–5058

Combination of surface characterization techniques for investigating optical thin-film components

Angela Duparré and Stefan Jakobs  »View Author Affiliations

Applied Optics, Vol. 35, Issue 25, pp. 5052-5058 (1996)

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To meet the requirements of comprehensively characterizing the morphology of thin films and substrates, a suitable combination of different measuring techniques should be chosen, i.e., a nonoptical surface profile measurement should be used together with optical analysis. It is demonstrated on selected examples of fluoride and oxide films that the use of atomic force microscopy and light scattering fulfills the demand of appropriate quantitative characterization over a sufficiently large range of bandwidths.

© 1996 Optical Society of America

Original Manuscript: January 2, 1996
Revised Manuscript: February 20, 1996
Published: September 1, 1996

Angela Duparré and Stefan Jakobs, "Combination of surface characterization techniques for investigating optical thin-film components," Appl. Opt. 35, 5052-5058 (1996)

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