OSA's Digital Library

Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5067–5072

Optical and mechanical characterization of evaporated SiO2 layers. Long-term evolution

K. Scherer, L. Nouvelot, P. Lacan, and R. Bosmans  »View Author Affiliations


Applied Optics, Vol. 35, Issue 25, pp. 5067-5072 (1996)
http://dx.doi.org/10.1364/AO.35.005067


View Full Text Article

Enhanced HTML    Acrobat PDF (336 KB)





Browse Journals / Lookup Meetings

Browse by Journal and Year


   


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools

Share
Citations

Abstract

Numerous characterizations were performed on 120-nm thick evaporated SiO2 layers in order to understand how their features change as a function of deposition conditions and time. Density decreases with increasing deposition pressure. It governs all the layer properties (refractive index, hardness, and stress). In situ stress measurements show that stress can be divided into intrinsic and water-induced components, respectively linked to local density (outside the pores) and porosity. Intrinsic stress increase with decreasing pressure is explained by a diminution of the Si-O-Si bond angle (IR measurements). Long-term evolution is characterized by stress relaxation related to Si-O-Si strained bond hydrolysis.

© 1996 Optical Society of America

History
Original Manuscript: November 20, 1995
Revised Manuscript: February 16, 1996
Published: September 1, 1996

Citation
K. Scherer, L. Nouvelot, P. Lacan, and R. Bosmans, "Optical and mechanical characterization of evaporated SiO2 layers. Long-term evolution," Appl. Opt. 35, 5067-5072 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-25-5067


Sort:  Author  |  Year  |  Journal  |  Reset  

References

  1. M. F. Doener, W. D. Nix, “A method for interpreting data from depth-sensing indentation instruments,” J. Mater. Res. 1, 601–609 (1986). [CrossRef]
  2. D. B. Fabes, W. C. Oliver, R. A. McKee, F. J. Walker, “The determination of film hardness from the composite response of film and substrate to nanometer scale indentations,” J. Mater. Res. 7, 3056–3064 (1992). [CrossRef]
  3. H. Leplan, B. Geenen, J. Y. Robic, Y. Pauleau, “Residual stresses in evaporated silicon dioxide thin films: correlation with deposition parameters and aging behavior,” J. Appl. Phys. 78, 962–968 (1995). [CrossRef]
  4. E. H. Hirsch, “Stress in porous thin films through adsorption of polar molecules,” J. Phys. D 13, 2081–2094 (1980). [CrossRef]
  5. H. Sankur, W. Gunning, “Sorbed water and intrinsic stress in composite TiO2–SiO2 films,” J. Appl. Phys. 66, 807–812 (1989). [CrossRef]
  6. G. Lucovsky, M. J. Manitini, J. K. Srivastava, E. A. Irene, “Low-temperature growth of silicon dioxide films: a study of chemical bonding by ellipsometry and infrared spectroscopy,” J. Vac. Sci. Technol. B 5, 530–537 (1987). [CrossRef]
  7. W. A. Pliskin, “Comparison of properties of dielectric films deposited by various methods,” J. Vac. Sci. Technol. 14, 1064–1080 (1977). [CrossRef]
  8. J. A. Theil, D. V. Tsu, M. W. Watkins, S. S. Kim, G. Lucovsky, “Local bonding environments of Si-OH groups in SiO2 deposited by remote plasma-enhanced chemical vapor deposition and incorporated by postdeposition exposure to water vapor,” J. Vac. Sci. Technol. A 8, 1374–1381 (1990). [CrossRef]

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.


« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited