OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5091–5094

Optical properties of hafnia and coevaporated hafnia:magnesium fluoride thin films

Y. Tsou and F. C. Ho  »View Author Affiliations

Applied Optics, Vol. 35, Issue 25, pp. 5091-5094 (1996)

View Full Text Article

Enhanced HTML    Acrobat PDF (294 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Mixed films of HfO2 and MgF2 were prepared by the e-beam coevaporation of two source materials with or without the presence of ion assistance. Optical properties and hardness of mixed films were compared among various compositions that were achieved by controlling the deposition rate of MgF2. Results obtained from pure materials confirmed the densification of HfO2 and the increased absorption in MgF2 with a higher discharge voltage. A refractive index of a composite film from 1.38 to 1.91 was achievable with various HfO2:MgF2 deposition rate ratios. A low-index composite material with improved hardness may be substituted for the soft MgF2.

© 1996 Optical Society of America

Original Manuscript: November 27, 1995
Revised Manuscript: March 27, 1996
Published: September 1, 1996

Y. Tsou and F. C. Ho, "Optical properties of hafnia and coevaporated hafnia:magnesium fluoride thin films," Appl. Opt. 35, 5091-5094 (1996)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. R.-Y. Tsai, M.-Y. Hua, C.-T. Wei, F. C. Ho, “Characterization of composite TiO2–MgF2 films prepared by reactive ion-assisted coevaporation,” Opt. Eng. 33, 3411–3418 (1994). [CrossRef]
  2. R. Jacobsson, “Inhomogeneous and coevaporated homogeneous films for optical applications,” Phys. Thin Films 8, 51–98 (1975).
  3. S. M. Edlou, A. Smajkiewicz, G. A. Al-Jumaily, “Optical properties and environmental stability of oxide coatings deposited by reactive sputtering,” Appl. Opt. 32, 5601–5605 (1993). [CrossRef] [PubMed]
  4. K. H. Guenther, H. K. Pulker, “Electron microscopic investigations of cross sections of optical thin films,” Appl. Opt. 15, 1992–2997 (1976). [CrossRef]
  5. F. A. Smidt, “Use of ion beam assisted deposition to modify the microstructure and properties of thin films,” Int. Mater. Rev. 35, 61–128 (1990). [CrossRef]
  6. R. Swanepoel, “Determination of the thickness and optical constants of amorphous silican,” J. Phys. E 16, 1214–1222 (1983). [CrossRef]
  7. Power Diffraction File Alphabetical Indexes Inorganic Phases Sets 1–42, Card 6-318. (Joint Committee on Powder Diffraction Standards, Swarthmore, Pa., 1992).
  8. J. D. Targove, M. J. Messerly, J. P. Lehan, C. C. Weng, R. H. Potoff, H. A. Macleod, L. C. McIntyre, J. A. Leavitt, “Ion-assisted deposition of fluorides,” in Optical Thin Films II: New Developments, R. I. Seddon, Proc. SPIE678, 115–122 (1986).

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited