Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system
Applied Optics, Vol. 35, Issue 25, pp. 5095-5101 (1996)
http://dx.doi.org/10.1364/AO.35.005095
Acrobat PDF (537 KB)
Abstract
Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. The experimental design analysis showed the compromises involved with evaporating these oxides.
© 1996 Optical Society of America
[Optical Society of America ]
Citation
Robert Chow and Nick Tsujimoto, "Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system," Appl. Opt. 35, 5095-5101 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-25-5095
You do not have subscription access to this journal. Citation lists with outbound citation links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Cited by links are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription
You do not have subscription access to this journal. Article level metrics are available to subscribers only. You may subscribe either as an OSA member, or as an authorized user of your institution.
Contact your librarian or system administrator
or
Log in to access OSA Member Subscription





OSA is a member of 