OSA's Digital Library

Applied Optics

Applied Optics


  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5095–5101

Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system

Robert Chow and Nick Tsujimoto  »View Author Affiliations

Applied Optics, Vol. 35, Issue 25, pp. 5095-5101 (1996)

View Full Text Article

Enhanced HTML    Acrobat PDF (537 KB)

Browse Journals / Lookup Meetings

Browse by Journal and Year


Lookup Conference Papers

Close Browse Journals / Lookup Meetings

Article Tools



Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. The experimental design analysis showed the compromises involved with evaporating these oxides.

© 1996 Optical Society of America

Original Manuscript: August 11, 1995
Revised Manuscript: January 31, 1996
Published: September 1, 1996

Robert Chow and Nick Tsujimoto, "Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system," Appl. Opt. 35, 5095-5101 (1996)

Sort:  Author  |  Year  |  Journal  |  Reset  


  1. R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, M. R. Kozlowski, “Reactive evaporation of low defect density hafnia,” Appl. Opt. 32, 5567–2274 (1993). [CrossRef] [PubMed]
  2. R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Proceedings of Optical Thin Film IV: New Developments, J. D. Rancourt, ed. Proc. SPIE2262, 60–66 (1994).
  3. H. K. Pulker, Coatings on Glass, 3rd ed. (Elsevier, Amsterdam, 1987), Chap. 6, p. 177, Eq. 59.
  4. D. H. Doehlert, Basic Experimental Strategies, 6th ed. (The Experimental Strategies Foundation, Seattle, Wash., 1992), Chaps. 11, 13, and 21.
  5. jmp, version 2.0.5, SAS Institute Inc., SAS Campus Dr., Cary, N.C. 27513.
  6. R. J. Hill, ed., Physical Vapor Deposition (Temescal, Berkeley, Calif., 1986), p. 46.
  7. H. R. Smith, “Deposition distribution and rates from electron-beam-heated vapor sources,” in the Society of Vacuum Coaters Twelfth Annual Technical Conference Proceedings (Society of Vacuum Coaters, Albuquerque, N.M., 1969), pp. 50–54.

Cited By

Alert me when this paper is cited

OSA is able to provide readers links to articles that cite this paper by participating in CrossRef's Cited-By Linking service. CrossRef includes content from more than 3000 publishers and societies. In addition to listing OSA journal articles that cite this paper, citing articles from other participating publishers will also be listed.

« Previous Article  |  Next Article »

OSA is a member of CrossRef.

CrossCheck Deposited