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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5095–5101

Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system

Robert Chow and Nick Tsujimoto  »View Author Affiliations


Applied Optics, Vol. 35, Issue 25, pp. 5095-5101 (1996)
http://dx.doi.org/10.1364/AO.35.005095


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Abstract

Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. The experimental design analysis showed the compromises involved with evaporating these oxides.

© 1996 Optical Society of America

History
Original Manuscript: August 11, 1995
Revised Manuscript: January 31, 1996
Published: September 1, 1996

Citation
Robert Chow and Nick Tsujimoto, "Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system," Appl. Opt. 35, 5095-5101 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-25-5095

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