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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5095–5101

Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system

Robert Chow and Nick Tsujimoto  »View Author Affiliations


Applied Optics, Vol. 35, Issue 25, pp. 5095-5101 (1996)
http://dx.doi.org/10.1364/AO.35.005095


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Abstract

Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. The experimental design analysis showed the compromises involved with evaporating these oxides.

© 1996 Optical Society of America

History
Original Manuscript: August 11, 1995
Revised Manuscript: January 31, 1996
Published: September 1, 1996

Citation
Robert Chow and Nick Tsujimoto, "Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system," Appl. Opt. 35, 5095-5101 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-25-5095


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References

  1. R. Chow, S. Falabella, G. E. Loomis, F. Rainer, C. J. Stolz, M. R. Kozlowski, “Reactive evaporation of low defect density hafnia,” Appl. Opt. 32, 5567–2274 (1993). [CrossRef] [PubMed]
  2. R. J. Tench, M. R. Kozlowski, R. Chow, “Defect geometries and laser-induced damage in multilayer coatings,” in Proceedings of Optical Thin Film IV: New Developments, J. D. Rancourt, ed. Proc. SPIE2262, 60–66 (1994).
  3. H. K. Pulker, Coatings on Glass, 3rd ed. (Elsevier, Amsterdam, 1987), Chap. 6, p. 177, Eq. 59.
  4. D. H. Doehlert, Basic Experimental Strategies, 6th ed. (The Experimental Strategies Foundation, Seattle, Wash., 1992), Chaps. 11, 13, and 21.
  5. jmp, version 2.0.5, SAS Institute Inc., SAS Campus Dr., Cary, N.C. 27513.
  6. R. J. Hill, ed., Physical Vapor Deposition (Temescal, Berkeley, Calif., 1986), p. 46.
  7. H. R. Smith, “Deposition distribution and rates from electron-beam-heated vapor sources,” in the Society of Vacuum Coaters Twelfth Annual Technical Conference Proceedings (Society of Vacuum Coaters, Albuquerque, N.M., 1969), pp. 50–54.

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