Reactive oxygen evaporation characteristics were determined as a function of the front-panel control parameters provided by a programmable, high-frequency sweep e-beam system. An experimental design strategy used deposition rate, beam speed, pattern, azimuthal rotation speed, and dwell time as the variables. The optimal settings for obtaining a broad thickness distribution, efficient silicon dioxide boule consumption, and minimal hafnium dioxide defect density were generated. The experimental design analysis showed the compromises involved with evaporating these oxides.
© 1996 Optical Society of America
Original Manuscript: August 11, 1995
Revised Manuscript: January 31, 1996
Published: September 1, 1996
Robert Chow and Nick Tsujimoto, "Silicon dioxide and hafnium dioxide evaporation characteristics from a high-frequency sweep e-beam system," Appl. Opt. 35, 5095-5101 (1996)