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Applied Optics

Applied Optics


  • Vol. 35, Iss. 25 — Sep. 1, 1996
  • pp: 5134–5147

Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region

Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, and Charles M. Falco  »View Author Affiliations

Applied Optics, Vol. 35, Issue 25, pp. 5134-5147 (1996)

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We have performed an experimental investigation of Ti-, B4C-, B-, and Y-based multilayer mirrors for the soft x-ray–extreme ultraviolet (XUV) wavelength region between 2.0 and 12.0 nm. Eleven different material pairs were studied: Ti/Ni, Ti/Co, Ti/Cu, Ti/W, B4C/Pd, B/Mo, Y/Pd, Y/Ag, Y/Mo, Y/Nb, and Y/C. The multilayers were sputter deposited and were characterized with a number of techniques, including low-angle x-ray diffraction and normal incidence XUV reflectometry. Among the Ti-based multilayers the best results were obtained with Ti/W, with peak reflectances up to 5.2% at 2.79 nm at 61° from normal incidence. The B4C/Pd and B/Mo multilayer mirrors had near-normal incidence (5°) peak reflectances of 11.5% at 8.46 nm and 9.4% at 6.67 nm, respectively, whereas a Y/Mo multilayer mirror had a maximum peak reflectance of 25.6% at 11.30 nm at the same angle. The factors limiting the peak reflectance of these different multilayer mirrors are discussed.

© 1996 Optical Society of America

Original Manuscript: October 23, 1995
Revised Manuscript: February 22, 1996
Published: September 1, 1996

Claude Montcalm, Patrick A. Kearney, J. M. Slaughter, Brian T. Sullivan, M. Chaker, Henri Pépin, and Charles M. Falco, "Survey of Ti-, B-, and Y-based soft x-ray–extreme ultraviolet multilayer mirrors for the 2- to 12-nm wavelength region," Appl. Opt. 35, 5134-5147 (1996)

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