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Applied Optics

Applied Optics


  • Vol. 35, Iss. 28 — Oct. 1, 1996
  • pp: 5545–5552

Optical inhomogeneity and microstructure of ZrO2 thin films prepared by ion-assisted deposition

Hyun Ju Cho and Chang Kwon Hwangbo  »View Author Affiliations

Applied Optics, Vol. 35, Issue 28, pp. 5545-5552 (1996)

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The index inhomogeneity and the microstructure of ZrO2 films prepared by Ar-ion-assisted deposition are investigated. The results show that as the Ar-ion momentum transferred to the growing film increases, the average refractive index increases, the vacuum-to-air spectral shift becomes almost zero, the sign of relative inhomogeneity transits from negative to positive, and the void fraction of the top layer next to air becomes smaller than that of the bottom one. These optical properties result from the improved packing density and denser outer region next to air. The Ar-ion bombardment also induces the changes in microstructure of ZrO2 films, such as the preferential (111) orientation of cubic phase, increase in compressive stress, and reduction of surface roughness.

© 1996 Optical Society of America

Original Manuscript: November 16, 1995
Revised Manuscript: March 18, 1996
Published: October 1, 1996

Hyun Ju Cho and Chang Kwon Hwangbo, "Optical inhomogeneity and microstructure of ZrO2 thin films prepared by ion-assisted deposition," Appl. Opt. 35, 5545-5552 (1996)

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