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Applied Optics

Applied Optics


  • Vol. 35, Iss. 28 — Oct. 1, 1996
  • pp: 5553–5556

Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films

Alexander Zuber, Heidrun Jänchen, and Norbert Kaiser  »View Author Affiliations

Applied Optics, Vol. 35, Issue 28, pp. 5553-5556 (1996)

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A new measurement technique for the characterization of uniaxial as well as biaxial anisotropic surfaces and thin films is introduced. This technique is based on perpendicular-incidence photometric ellipsometry, in which a spectral-photometric dynamic ellipsometer with a rotating polarizer is used. This method is sensitive, contactless, nondestructive, and efficient for the estimation of anisotropic behavior. Furthermore, the spectroscopic measurement directly provides the anisotropy dispersion down to the UV wavelength range. Results on structurally anisotropic HfO2 coatings are presented.

© 1996 Optical Society of America

Original Manuscript: November 8, 1995
Revised Manuscript: March 18, 1996
Published: October 1, 1996

Alexander Zuber, Heidrun Jänchen, and Norbert Kaiser, "Perpendicular-incidence photometric ellipsometry of biaxial anisotropic thin films," Appl. Opt. 35, 5553-5556 (1996)

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