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Applied Optics

Applied Optics


  • Vol. 35, Iss. 28 — Oct. 1, 1996
  • pp: 5609–5612

Temperature-stable bandpass filters deposited with plasma ion-assisted deposition

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing  »View Author Affiliations

Applied Optics, Vol. 35, Issue 28, pp. 5609-5612 (1996)

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Plasma ion-assisted deposition with an advanced plasma source was investigated to produce narrow-bandpass filters in the near-infrared spectral range for telecommunication applications. The multilayer coatings were qualified by the optical performance, the vacuum-to-air behavior, the temperature stability, and the film stress. TiO2/SiO2 and Ta2O5/SiO2 material combinations were used and compared. The coating system produced low absorbing multilayers with a very low coefficient of expansion and low stress. The coefficient of expansion was in the low 10−6 °C range, and film stress values in the range between 1 and 2 × 108 N/m2 were obtained. TiO2/SiO2 was the preferred material combination. The optical monitoring system allowed the production of bandpass filters with a performance close to that of the theoretical values.

© 1996 Optical Society of America

Original Manuscript: November 17, 1995
Revised Manuscript: March 6, 1996
Published: October 1, 1996

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996)

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