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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 28 — Oct. 1, 1996
  • pp: 5609–5612

Temperature-stable bandpass filters deposited with plasma ion-assisted deposition

A. Zöller, R. Götzelmann, K. Matl, and D. Cushing  »View Author Affiliations


Applied Optics, Vol. 35, Issue 28, pp. 5609-5612 (1996)
http://dx.doi.org/10.1364/AO.35.005609


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Abstract

Plasma ion-assisted deposition with an advanced plasma source was investigated to produce narrow-bandpass filters in the near-infrared spectral range for telecommunication applications. The multilayer coatings were qualified by the optical performance, the vacuum-to-air behavior, the temperature stability, and the film stress. TiO2/SiO2 and Ta2O5/SiO2 material combinations were used and compared. The coating system produced low absorbing multilayers with a very low coefficient of expansion and low stress. The coefficient of expansion was in the low 10−6 °C range, and film stress values in the range between 1 and 2 × 108 N/m2 were obtained. TiO2/SiO2 was the preferred material combination. The optical monitoring system allowed the production of bandpass filters with a performance close to that of the theoretical values.

© 1996 Optical Society of America

History
Original Manuscript: November 17, 1995
Revised Manuscript: March 6, 1996
Published: October 1, 1996

Citation
A. Zöller, R. Götzelmann, K. Matl, and D. Cushing, "Temperature-stable bandpass filters deposited with plasma ion-assisted deposition," Appl. Opt. 35, 5609-5612 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-28-5609


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References

  1. Y. Fujii, “Wavelength demultiplexer that uses an interference filter and achromatic quater-wave plates,” Opt. Lett. 16, 345–347 (1991). [CrossRef] [PubMed]
  2. P. J. Martin, R. P. Netterfield, “Optical films produced by ion-based techniques,” in Progress in Optics, E. Wolf, ed. (Elsevier, Amsterdam, 1986), Vol. XXIII, Chap. 3. [CrossRef]
  3. K. Matl, R. Götzelmann, A. Zöller, “Ion assisted deposition with a new plasma source,” Mater. Sci. Eng. A 140, 523–537 (1991). [CrossRef]
  4. A. Zöller, S. Beisswenger, R. Götzelmann, K. Matl, “Plasma ion assisted deposition: a novel technique for the production of optical coatings,” in Optical Interference Coatings, F. Abelès, ed., Proc. SPIE2253, 394–402 (1994).
  5. G. Hass, R. E. Thun, Physics of Thin Films (Academic, New York, 1966), Vol. 3, pp. 219–253.

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