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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 28 — Oct. 1, 1996
  • pp: 5613–5619

Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm

E. Eva, K. Mann, N. Kaiser, B. Anton, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, and E. Hacker  »View Author Affiliations


Applied Optics, Vol. 35, Issue 28, pp. 5613-5619 (1996)
http://dx.doi.org/10.1364/AO.35.005613


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Abstract

Highly reflective LaF3/MgF2 systems for a wavelength of 248 nm on MgF2 and crystalline quartz substrates were investigated. The influence of laser conditioning on damage threshold and absorptance was remarkable in those coatings that had a high initial absorptance. Monitoring with a laser calorimeter revealed the conditioning effect to be a function of the irradiation dose rather than of energy density or pulse rate. Furthermore, x-ray photoelectron spectroscopy and transmission electron microscopy investigations showed that conditioning induces stoichiometric and structural changes in the multilayers, especially in near-surface sublayers, whereas scanning electron microscopy and atomic force microscopy investigations indicated that the surface remains unchanged.

© 1996 Optical Society of America

History
Original Manuscript: November 17, 1995
Revised Manuscript: February 13, 1996
Published: October 1, 1996

Citation
E. Eva, K. Mann, N. Kaiser, B. Anton, R. Henking, D. Ristau, P. Weissbrodt, D. Mademann, L. Raupach, and E. Hacker, "Laser conditioning of LaF3/MgF2 dielectric coatings at 248 nm," Appl. Opt. 35, 5613-5619 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-28-5613

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