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Applied Optics

Applied Optics


  • Vol. 35, Iss. 32 — Nov. 10, 1996
  • pp: 6304–6319

Excimer laser use for microetching computer-generated holographic structures

N. A. Vainos, S. Mailis, S. Pissadakis, L. Boutsikaris, P. J. M. Parmiter, P. Dainty, and T. J. Hall  »View Author Affiliations

Applied Optics, Vol. 35, Issue 32, pp. 6304-6319 (1996)

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Excimer-laser microetching of a variety of materials is applied to the fabrication of surface-relief optical microstructures of arbitrary morphology, with particular emphasis on computer-generated holographic structures. High-definition, high-radiation-intensity selective laser ablative etching in conjunction with step-and-repeat (period) replication or raster (pixel) scanning is used. To support such developments, the characteristic etching properties of a wide range of solid materials, from metals to semiconductors and polymers, are studied. Optical-interconnect and generic object holograms are produced by means of this alternative one-step holographic information-recording method.

© 1996 Optical Society of America

Original Manuscript: October 16, 1995
Revised Manuscript: May 17, 1996
Published: November 10, 1996

N. A. Vainos, S. Mailis, S. Pissadakis, L. Boutsikaris, P. J. M. Parmiter, P. Dainty, and T. J. Hall, "Excimer laser use for microetching computer-generated holographic structures," Appl. Opt. 35, 6304-6319 (1996)

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