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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 34 — Dec. 1, 1996
  • pp: 6663–6668

Scanning optical microellipsometer for pure surface profiling

Chung Wah See, Michael G. Somekh, and Richard D. Holmes  »View Author Affiliations


Applied Optics, Vol. 35, Issue 34, pp. 6663-6668 (1996)
http://dx.doi.org/10.1364/AO.35.006663


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Abstract

We describe a scanning optical interferometer that can simultaneously perform ellipsometry measurements and thus provides a true surface profile. This is accomplished by projecting the back focal plane of the objective lens onto a CCD array. The measured phase differences between the p- and s-polarization components are converted, by using a specially developed algorithm, to optical phase changes caused by material variations. The compensation process is then applied to extract the true profile of the object surface. Experimental results obtained with the system are shown.

© 1996 Optical Society of America

History
Original Manuscript: January 29, 1996
Revised Manuscript: April 8, 1996
Published: December 1, 1996

Citation
Chung Wah See, Michael G. Somekh, and Richard D. Holmes, "Scanning optical microellipsometer for pure surface profiling," Appl. Opt. 35, 6663-6668 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-34-6663

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