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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 35, Iss. 34 — Dec. 1, 1996
  • pp: 6703–6707

Simultaneous determination of refractive index, extinction coefficient, and void distribution of titanium dioxide thin film by optical methods

S. Y. Kim  »View Author Affiliations


Applied Optics, Vol. 35, Issue 34, pp. 6703-6707 (1996)
http://dx.doi.org/10.1364/AO.35.006703


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Abstract

The refractive index n(λ) and the extinction coefficient k(λ) of a TiO2 film prepared by electron-beam evaporation are determined in the spectral region 1.5–5.5 eV. The transmission spectrum of the TiO2 film on a vitreous silica specimen is inverted to get the k(λ) of TiO2 in its interband transition region. Above 3.5 eV, k(λ) is used to get the coefficients of the quantum mechanically derived dispersion relation of an amorphous TiO2. These coefficients and n are used to determine n(λ). The modeling procedure is applied to spectroscopic ellipsometry data of a TiO2 film on a c-Si specimen, and the void distribution of the film is revealed. With spectroscopic ellipsometry data above the fundamental band gap, valuable information about surface roughness is obtained. The effective thickness of this rough surface layer is confirmed by an atomic force microscopy measurement.

© 1996 Optical Society of America

History
Original Manuscript: October 11, 1995
Revised Manuscript: March 11, 1996
Published: December 1, 1996

Citation
S. Y. Kim, "Simultaneous determination of refractive index, extinction coefficient, and void distribution of titanium dioxide thin film by optical methods," Appl. Opt. 35, 6703-6707 (1996)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-35-34-6703


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References

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  2. E. Pelletier, “Methods for determining optical parameters of thin films,” in Handbook of Optical Constants of Solids II, E. D. Palik, ed. (Academic, Toronto, 1991), Chap. 3.
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