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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 13 — May. 1, 1997
  • pp: 2830–2838

High-wavelength-resolution extreme-ultraviolet multilayer mirror

Shin’ichi Nagata, Saku Tsuneta, Taro Sakao, Tsuyoshi Yoshida, Hirohisa Hara, Ryouhei Kano, Wakana Ishiyama, Katsuhiko Murakami, and Masayuki Ohtan  »View Author Affiliations


Applied Optics, Vol. 36, Issue 13, pp. 2830-2838 (1997)
http://dx.doi.org/10.1364/AO.36.002830


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Abstract

Multilayer mirrors with a system wavelength resolution (λ/Δλ) as high as 30–50 are required for the diagnostics of cosmic plasmas with temperatures of 1–20 MK. Such a high wavelength resolution can be realized by increasing the number of layer pairs contributing to the reflectance, by selecting less-absorbing materials for both the reflector and the spacer, and by decreasing the thickness of the reflector. We have fabricated a multilayer mirror tuned to 284 Å with a silicon carbide reflector (20% thickness of the layer period) and an aluminum spacer and achieved λ/Δλ ∼ 26.8 with a peak reflectivity of ∼13.0%. This wavelength resolution is close to the value obtained with a numerical simulation and is considerably higher than the value obtained with the conventional Mo/Si multilayer.

© 1997 Optical Society of America

History
Original Manuscript: August 8, 1996
Revised Manuscript: October 22, 1996
Published: May 1, 1997

Citation
Shin’ichi Nagata, Saku Tsuneta, Taro Sakao, Tsuyoshi Yoshida, Hirohisa Hara, Ryouhei Kano, Wakana Ishiyama, Katsuhiko Murakami, and Masayuki Ohtan, "High-wavelength-resolution extreme-ultraviolet multilayer mirror," Appl. Opt. 36, 2830-2838 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-13-2830

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