Multilayer mirrors with a system wavelength resolution (λ/Δλ) as high as 30–50 are required for the diagnostics of cosmic plasmas with temperatures of 1–20 MK. Such a high wavelength resolution can be realized by increasing the number of layer pairs contributing to the reflectance, by selecting less-absorbing materials for both the reflector and the spacer, and by decreasing the thickness of the reflector. We have fabricated a multilayer mirror tuned to 284 Å with a silicon carbide reflector (20% thickness of the layer period) and an aluminum spacer and achieved λ/Δλ ∼ 26.8 with a peak reflectivity of ∼13.0%. This wavelength resolution is close to the value obtained with a numerical simulation and is considerably higher than the value obtained with the conventional Mo/Si multilayer.
© 1997 Optical Society of America
Original Manuscript: August 8, 1996
Revised Manuscript: October 22, 1996
Published: May 1, 1997
Shin’ichi Nagata, Saku Tsuneta, Taro Sakao, Tsuyoshi Yoshida, Hirohisa Hara, Ryouhei Kano, Wakana Ishiyama, Katsuhiko Murakami, and Masayuki Ohtan, "High-wavelength-resolution extreme-ultraviolet multilayer mirror," Appl. Opt. 36, 2830-2838 (1997)