We report a new material combination, C/Si, for normal-incidence multilayer mirrors in the wavelength region 25–30 nm. The multilayers, fabricated by ion-beam-sputtering deposition, were characterized by near-normal-incidence reflectance measurements by using a discharge source and a grazing-incidence monochromator. The highest measured near-normal-incidence reflectance was <i>R</i> = 23% (25.6 nm), <i>R</i> = 20% (28.3 nm), <i>R</i> = 25% (30.4 nm) at incident angles of 10°, 12°, and 4°, respectively. The multilayers were also characterized by transmission electron microscopy, which revealed sharp layer interfaces and low interfacial roughness.
© 1997 Optical Society of America
Marius Grigonis and Émile J. Knystautas, "C/Si multilayer mirrors for the 25–30-nm wavelength region," Appl. Opt. 36, 2839-2842 (1997)