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Applied Optics

Applied Optics


  • Vol. 36, Iss. 13 — May. 1, 1997
  • pp: 2839–2842

C/Si multilayer mirrors for the 25–30-nm wavelength region

Marius Grigonis and Émile J. Knystautas  »View Author Affiliations

Applied Optics, Vol. 36, Issue 13, pp. 2839-2842 (1997)

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We report a new material combination, C/Si, for normal-incidence multilayer mirrors in the wavelength region 25–30 nm. The multilayers, fabricated by ion-beam-sputtering deposition, were characterized by near-normal-incidence reflectance measurements by using a discharge source and a grazing-incidence monochromator. The highest measured near-normal-incidence reflectance was R = 23% (25.6 nm), R = 20% (28.3 nm), R = 25% (30.4 nm) at incident angles of 10°, 12°, and 4°, respectively. The multilayers were also characterized by transmission electron microscopy, which revealed sharp layer interfaces and low interfacial roughness.

© 1997 Optical Society of America

Original Manuscript: May 28, 1996
Published: May 1, 1997

Marius Grigonis and Émile J. Knystautas, "C/Si multilayer mirrors for the 25–30-nm wavelength region," Appl. Opt. 36, 2839-2842 (1997)

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