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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 13 — May. 1, 1997
  • pp: 2843–2847

Comparison of the exposure characteristics of soft-x-ray film SIOFM-5FW with Kodak 101-05 and Ilford Q-plates

Pin-zhong Fan, Jin-zhi Zhou, and Yue-lin Li  »View Author Affiliations


Applied Optics, Vol. 36, Issue 13, pp. 2843-2847 (1997)
http://dx.doi.org/10.1364/AO.36.002843


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Abstract

In identical exposure and processing conditions, we compare the exposure characteristics of soft-x-ray film, SIOFM-5FW, with Kodak101-05 and Ilford Q-plates in the soft-x-ray and extreme UV region below 100 nm, using D-19 and Phenisol developers. The experimental results show that for radiation greater than 10 nm, the response of SIOFM-5FW lies between the Kodak101-05 and the Ilford Q-plates but is closer to the former. For radiation of less than 10 nm, the SIOFM-5FW is more sensitive than the Kodak101-05 plate, with a higher saturated optical density, a higher dynamic range, and an obvious carbon K absorption edge structure in the spectra obtained. The effects of the two developers used on the exposure characteristics are discussed.

© 1997 Optical Society of America

History
Original Manuscript: July 1, 1996
Revised Manuscript: October 15, 1996
Published: May 1, 1997

Citation
Pin-zhong Fan, Jin-zhi Zhou, and Yue-lin Li, "Comparison of the exposure characteristics of soft-x-ray film SIOFM-5FW with Kodak 101-05 and Ilford Q-plates," Appl. Opt. 36, 2843-2847 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-13-2843

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