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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 15 — May. 20, 1997
  • pp: 3261–3270

Absolute concentration measurements of CH radicals in a diamond-depositing dc-arcjet reactor

J. Luque, W. Juchmann, and J. B. Jeffries  »View Author Affiliations


Applied Optics, Vol. 36, Issue 15, pp. 3261-3270 (1997)
http://dx.doi.org/10.1364/AO.36.003261


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Abstract

Laser-induced fluorescence in the CH (<i>B</i> – <i>X</i>) and CH (<i>A</i> – <i>X</i>) electronic transitions is used to measure absolute number density versus position for CH radicals in the plume of a 25-Torr hydrogen/argon/methane (0.8:1:0.005) dc arcjet during the chemical vapor deposition of diamond film. The laser-induced-fluorescence signal is calibrated with argon Rayleigh scattering, and the resultant concentration of the CH radical in the center of the arcjet plume is found to be (3.5 ± 0.8) × 10<sup>12</sup> molecules/cm<sup>3</sup>. The characterization of the plasma plume shows three different regions in the reacting gas: nozzle, plume, and boundary layer. We observe substantial differences in spatial distribution of gas temperature, collisional quenching, and CH number density among these regions.

© 1997 Optical Society of America

Citation
J. Luque, W. Juchmann, and J. B. Jeffries, "Absolute concentration measurements of CH radicals in a diamond-depositing dc-arcjet reactor," Appl. Opt. 36, 3261-3270 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-15-3261

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