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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 16 — Jun. 1, 1997
  • pp: 3769–3775

Precise measuring method for detecting the in situ distortion profile of a high-heat-load mirror for synchrotron radiation by use of a pentaprism long trace profiler

Shinan Qian, Werner Jark, Giovanni Sostero, Alessandro Gambitta, Fabio Mazzolini, and Adolfo Savoia  »View Author Affiliations


Applied Optics, Vol. 36, Issue 16, pp. 3769-3775 (1997)
http://dx.doi.org/10.1364/AO.36.003769


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Abstract

A precise measuring method for detecting the in situ distortion profile of a high-heat-load mirror for synchrotron radiation by use of a pentaprism long trace profiler (LTP) is presented. A maximum distortion of 0.47 µm across a length of 180 mm was measured for an internally water-cooled mirror on an undulator beam line at ELETTRA while exposed to a total emitted power of 600 W. This first successfully tested in situ distortion profile points out the importance and need for this method. Two configurations for performing in situ LTP tests are discussed. For this measurement the configuration with all the equipment external to the vacuum chamber was used. The experiment has an accuracy and a repeatability of 0.04 µm. Suggestions for improving the accuracy and stability are presented.

© 1997 Optical Society of America

History
Original Manuscript: March 26, 1996
Revised Manuscript: October 3, 1996
Published: June 1, 1997

Citation
Shinan Qian, Werner Jark, Giovanni Sostero, Alessandro Gambitta, Fabio Mazzolini, and Adolfo Savoia, "Precise measuring method for detecting the in situ distortion profile of a high-heat-load mirror for synchrotron radiation by use of a pentaprism long trace profiler," Appl. Opt. 36, 3769-3775 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-16-3769


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References

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