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Applied Optics

Applied Optics

APPLICATIONS-CENTERED RESEARCH IN OPTICS

  • Vol. 36, Iss. 19 — Jul. 1, 1997
  • pp: 4411–4418

Computer-generated microcooled reflection holograms in silicon for material processing with a CO2 laser

Ch. Haupt, M. Pahlke, R. Krupka, and H. J. Tiziani  »View Author Affiliations


Applied Optics, Vol. 36, Issue 19, pp. 4411-4418 (1997)
http://dx.doi.org/10.1364/AO.36.004411


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Abstract

We report on the design, fabrication, and testing of multilevel computer-generated reflection holograms in Si for CO2 laser material processing for laser intensities of <2 kW/cm2. The holograms are designed with an iterative method based on scalar diffraction theory. In this case the reconstructed intensity distribution is independent of the incident high-power laser mode. For achieving high diffraction efficiencies, multilevel staircase surface topologies are fabricated by multimask and reactive ion-etching technology on the front side of a polished Si wafer. For efficient hologram cooling, a gratinglike structure of microchannels is chemically etched on the back side of the Si wafer. Absorption and deformation measurements have been carried out on both a microcooled flat mirror and a reflection hologram. The maximum deformation amounts to 200 nm and is 10 times smaller than comparable conventional uncoated Cu mirrors. A diffraction efficiency of 88% is achieved with an eight-level reflection hologram and a 30-mm-diameter CO2 laser beam with a power of 5 kW.

© 1997 Optical Society of America

History
Original Manuscript: December 4, 1996
Published: July 1, 1997

Citation
Ch. Haupt, M. Pahlke, R. Krupka, and H. J. Tiziani, "Computer-generated microcooled reflection holograms in silicon for material processing with a CO2 laser," Appl. Opt. 36, 4411-4418 (1997)
http://www.opticsinfobase.org/ao/abstract.cfm?URI=ao-36-19-4411

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